Improved SiO2-coatings against high temperature sulphidation by internal stress reduction R. Hofman, J. G.F. Westheim, T. Fransen et P. J. GellingsJ. Phys. IV France, 03 C9 (1993) C9-865-C9-871DOI: https://doi.org/10.1051/jp4:1993989
