LOW PRESSURE CHEMICAL VAPOR DEPOSITION OF TIN OXIDE THIN FILMS FROM AN ORGANOMETALLIC COMPOUND. APPLICATION TO GAS DETECTION C. PIJOLAT, L. BRUNO et R. LALAUZEJ. Phys. IV France, 02 C2 (1991) C2-303-C2-310DOI: https://doi.org/10.1051/jp4:1991237
