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Article cité :
M. Ohtsuka , M. Matsumoto , K. Itagaki
J. Phys. IV France, 112 (2003) 899-902
Citations de cet article :
12 articles
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Surface Characteristics of Ni-Mn-Fe-Ga Sputtered Thin Films
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Effect of substrate on processing of multi-gun sputter deposited, near-stoichiometric Ni2MnGa thin films
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F. Bernard, P. Delobelle, C. Rousselot and L. Hirsinger Thin Solid Films 518 (1) 399 (2009) https://doi.org/10.1016/j.tsf.2009.06.037
Surface characteristics and nanoindentation study of Ni–Mn–Ga ferromagnetic shape memory sputtered thin films
C. Liu, Z.Y. Gao, X. An, et al. Applied Surface Science 254 (9) 2861 (2008) https://doi.org/10.1016/j.apsusc.2007.10.031
Thickness dependence of transformation characteristics of Ni–Mn–Ga thin films deposited on alumina: Experiment and modeling
V.A. Chernenko, M. Kohl, M. Ohtsuka, et al. Materials Science and Engineering: A 438-440 944 (2006) https://doi.org/10.1016/j.msea.2006.02.055
Structural and magnetic characterization of martensitic Ni–Mn–Ga thin films deposited on Mo foil
V.A. Chernenko, R. Lopez Anton, M. Kohl, et al. Acta Materialia 54 (20) 5461 (2006) https://doi.org/10.1016/j.actamat.2006.06.058
Surface characteristics of Ni–Ga–Fe sputtered thin films
W. Cai, H.B. Wang, X. An, et al. Materials Science and Engineering: A 438-440 994 (2006) https://doi.org/10.1016/j.msea.2006.02.091