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Cited article:

Applications des plasmas produits par le laser à excimères HERCULES-L : du recuit du silicium à la lithographie par rayons X

S. Bollanti, F. Bonfigli, P. Di Lazzaro, A. Faenov, F. Flora, G. Giordano, T. Letardi, T. Limongi, L. Mezi, D. Murra

J. Phys. IV France, 11 PR7 (2001) Pr7-133-Pr7-134

DOI: https://doi.org/10.1051/jp4:2001743

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This article has been cited by the following article(s):

In situ laser recrystallization of Si layers during low-pressure chemical vapor deposition: Recrystallization dynamics and influence of the seed layer

D. Della Sala, A. Santoni, L. Fornarini, et al.
Journal of Materials Research 17 (11) 2966 (2002)
https://doi.org/10.1557/JMR.2002.0430