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Article cité :
M. Schuisky , A. Hårsta
J. Phys. IV France, 09 PR8 (1999) Pr8-381-Pr8-386
Citations de cet article :
10 articles
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Epitaxial Stabilization of Oxides in Thin Films
O. Yu. Gorbenko, S. V. Samoilenkov, I. E. Graboy and A. R. Kaul Chemistry of Materials 14 (10) 4026 (2002) https://doi.org/10.1021/cm021111v
Epitaxial growth of TiO2 films in a hydroxyl-free atomic layer deposition process
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Atomic Layer Deposition of Thin Films Using O2 as Oxygen Source
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