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CVD Deposited Titania Thin Films for Gas Sensors with Improved Operating Characteristics

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Chemical Vapor Deposition 21 (10-11-12) 327 (2015)
https://doi.org/10.1002/cvde.201507187

The Effect of Solvent on the Phase of Titanium Dioxide Deposited by Aerosol‐assisted CVD

Cynthia Edusi, Gopinathan Sankar and Ivan P. Parkin
Chemical Vapor Deposition 18 (4-6) 126 (2012)
https://doi.org/10.1002/cvde.201106961

The Preparation of Titanium Dioxide Gas Sensors by the Electric Field Assisted Aerosol CVD Reaction of Titanium Isopropoxide in Toluene

Naitik Panjawi, Anupriya Naik, Michael E. A. Warwick, Geoffrey Hyett and Russell Binions
Chemical Vapor Deposition 18 (4-6) 102 (2012)
https://doi.org/10.1002/cvde.201106973

Production of Predominantly Anatase Thin Films on Various Grades of Steel and Other Metallic Substrates From TiCl4 and Ethyl Acetate by Atmospheric Pressure CVD

Alison J. Cross, Charles W. Dunnill and Ivan P. Parkin
Chemical Vapor Deposition 18 (4-6) 133 (2012)
https://doi.org/10.1002/cvde.201106964

Aerosol‐Assisted CVD of Titanium Dioxide Thin Films from Methanolic Solutions of Titanium Tetraisopropoxide; Substrate and Aerosol‐Selective Deposition of Rutile or Anatase

Cynthia Edusi, Geoffrey Hyett, Gopinathan Sankar and Ivan P. Parkin
Chemical Vapor Deposition 17 (1-3) 30 (2011)
https://doi.org/10.1002/cvde.201006872

Precursor-Directed Control of Crystalline Type in Atmospheric Pressure CVD Growth of TiO2 on Stainless Steel

Philip Evans, Martyn E. Pemble and David W. Sheel
Chemistry of Materials 18 (24) 5750 (2006)
https://doi.org/10.1021/cm060816k

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

G. Wahl, J. Arndt and O. Stadel
Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies 145 (2002)
https://doi.org/10.1007/978-94-010-0353-7_7