Articles citing this article

The Citing articles tool gives a list of articles citing the current article.
The citing articles come from EDP Sciences database, as well as other publishers participating in CrossRef Cited-by Linking Program. You can set up your personal account to receive an email alert each time this article is cited by a new article (see the menu on the right-hand side of the abstract page).

Cited article:

CVD process engineering : modelling aspects

J.-P. COUDERC

J. Phys. IV France, 03 C3 (1993) C3-3-C3-16

DOI: https://doi.org/10.1051/jp4:1993301

PDF (1.168 MB)

This article has been cited by the following article(s):

An innovative kinetic model allowing insight in the moderate temperature chemical vapor deposition of silicon oxynitride films from tris(dimethylsilyl)amine

Konstantina Christina Topka, Hugues Vergnes, Tryfon Tsiros, Paris Papavasileiou, Laura Decosterd, Babacar Diallo, François Senocq, Diane Samelor, Nadia Pellerin, Marie-Joëlle Menu, Constantin Vahlas and Brigitte Caussat
Chemical Engineering Journal 431 133350 (2022)
https://doi.org/10.1016/j.cej.2021.133350

The Price Effects of Event Risk Protection: The Results from a Natural Experiment

Karl S. Okamoto, David J. Pedersen and Natalie Bucciarelli Pedersen
SSRN Electronic Journal (2010)
https://doi.org/10.2139/ssrn.1641304

Les différentes voies de modélisation macroscopique du procédé de dépôt de SiC par voie gazeuse

J AUBRETON, E BLANQUET, M ELCHINGER and M PONS
Annales de Chimie Science des Matériaux 23 (5-6) 753 (1998)
https://doi.org/10.1016/S0151-9107(99)80022-1