Journal de Physique IV

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On the Use of H₂ Plasma for the Cleaning and Passivation of InP Substrates

G. Bruno, M. Losurdo and P. Capezzuto

J. Phys. IV France, 05 C5 (1995) C5-663-C5-670

DOI: 10.1051/jphyscol:1995579

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