Journal de Physique IV

Remote Microwave Plasma Enhanced Chemical Vapour Deposition of SiO₂ Films : Oxygen Plasma Diagnostic

C. Regnier, J. Desmaison, P. Tristant and D. Merle

J. Phys. IV France, 05 C5 (1995) C5-621-C5-628

DOI: 10.1051/jphyscol:1995574

C. Regnier

J. Desmaison

P. Tristant

D. Merle

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