Journal de Physique IV

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Remote Microwave Plasma Enhanced Chemical Vapour Deposition of Amorphous Carbon : Optical Emission Spectroscopy Characterisation of the Afterglow and Growth Rates

C. Tixier, P. Tristant, J. Desmaison and D. Merle

J. Phys. IV France, 05 C5 (1995) C5-593-C5-600

DOI: 10.1051/jphyscol:1995570

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