Journal de Physique IV

Chemical Vapor Deposition of ZrO₂ Thin Films Using Zr(NEt₂)4 as Precursor

A. Bastianini, G.A. Battiston, R. Gerbasi, M. Porchia and S. Daolio

J. Phys. IV France, 05 C5 (1995) C5-525-C5-531

DOI: 10.1051/jphyscol:1995561

A. Bastianini

G.A. Battiston

R. Gerbasi

M. Porchia

S. Daolio

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