Journal de Physique IV

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Vanadium Oxi-Carbide Coatings Deposited by OMCVD in an Isothermal Reactor

L. Poirier and F. Teyssandier

J. Phys. IV France, 05 C5 (1995) C5-473-C5-480

DOI: 10.1051/jphyscol:1995554

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