Journal de Physique IV

Reactor Modelling and Analysis of Amorphous Hydrogenated Silicon Deposition by PECVD

A. Djelloul, B. Despax, J.P. Couderc and P. Duverneuil

J. Phys. IV France, 05 C5 (1995) C5-307-C5-314

DOI: 10.1051/jphyscol:1995536

A. Djelloul

B. Despax

J.P. Couderc

P. Duverneuil

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