Journal de Physique IV

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Reactivities of TaCl₅ and H₂O as Precursors for Atomic Layer Deposition

H. Siimon and J. Aarik

J. Phys. IV France, 05 C5 (1995) C5-277-C5-282

DOI: 10.1051/jphyscol:1995532

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