Journal de Physique IV

Morphology and Thermal Stability of Me-Si-N (Me=Re, W, Ta) for Microelectronics

A.-M. Dutron, E. Blanquet, V. Ghetta, R. Madar and C. Bernard

J. Phys. IV France, 05 C5 (1995) C5-1141-C5-1148

DOI: 10.1051/jphyscol:19955135

A.-M. Dutron

E. Blanquet

V. Ghetta

R. Madar

C. Bernard

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