Journal de Physique IV

Kinetic Processes in the CVD of SiC from CH₃SiCl₃-H₂ in a Vertical Hot-Wall Reactor

F. Langlais, F. Loumagne, D. Lespiaux, S. Schamm and R. Naslain

J. Phys. IV France, 05 C5 (1995) C5-105-C5-112

DOI: 10.1051/jphyscol:1995510

F. Langlais

F. Loumagne

D. Lespiaux

S. Schamm

R. Naslain

Articles written by ALL the selected authors (AND)

Articles written by ANY OF the selected authors (OR)