Journal de Physique IV

Pulsed electron beam annealing: A tool for post-implantation damage control in SiC

D.J. Brink, H.W. Kunert, J.B. Malherbe and J. Camassel

J. Phys. IV France, 132 (2006) 215-219

Published online: 11 March 2006

DOI: 10.1051/jp4:2006132041

D.J. Brink

H.W. Kunert

J.B. Malherbe

J. Camassel

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