Journal de Physique IV

Modelling of silica film growth by chemical vapour deposition : Influence of the interface properties

L. Vázquez, F. Ojeda, R. Cuerno, R. Salvarezza and J.M. Albella

J. Phys. IV France, 11 PR3 (2001) Pr3-129-Pr3-140

DOI: 10.1051/jp4:2001316

L. Vázquez

F. Ojeda

R. Cuerno

R. Salvarezza

J.M. Albella

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