Journal de Physique IV

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NIR diode laser based process control for industrial CVD reactors

V. Hopfe, D.W. Sheel, D. Raisbeck, J. M. Rivero, W. Graehlert, O. Throl, A.M.B. van Mol and C.I.M.A. Spee

J. Phys. IV France, 11 PR3 (2001) Pr3-1153-Pr3-1159

DOI: 10.1051/jp4:20013145

V. Hopfe

D.W. Sheel

D. Raisbeck

J. M. Rivero

W. Graehlert

O. Throl

A.M.B. van Mol

C.I.M.A. Spee

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