Journal de Physique IV

Comparative study of atomic layer deposition and low-pressure MOCVD of copper sulfide thin films

B. Meester, L. Reijnen, A. Goossens and J. Schoonman

J. Phys. IV France, 11 PR3 (2001) Pr3-1147-Pr3-1152

DOI: 10.1051/jp4:20013144

B. Meester

L. Reijnen

A. Goossens

J. Schoonman

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