Journal de Physique IV

Selective area deposition of titanium dioxide thin films by light induced chemical vapour deposition

E. Halary-Wagner, P. Lambelet, G. Benvenuti and P. Hoffmann

J. Phys. IV France, 11 PR3 (2001) Pr3-825-Pr3-832

DOI: 10.1051/jp4:20013104

E. Halary-Wagner

P. Lambelet

G. Benvenuti

P. Hoffmann

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