Journal de Physique IV

Chemical vapor deposition of semi-insulating polycrystalline silicon (SIPOS) : Experience and simulation

P. Barathieu, B. Caussat, E. Scheid, D. Jaume and J.P. Couderc

J. Phys. IV France, 09 PR8 (1999) Pr8-173-Pr8-180

DOI: 10.1051/jp4:1999821

P. Barathieu

B. Caussat

E. Scheid

D. Jaume

J.P. Couderc

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