Journal de Physique IV

Deposition of ternary silicon based compounds by CVD techniques

F.J. Martí, A. Castro, J. Olivares, C. Gómez-Aleixandre and J.M. Albella

J. Phys. IV France, 09 PR8 (1999) Pr8-101-Pr8-107

DOI: 10.1051/jp4:1999813

F.J. Martí

A. Castro

J. Olivares

C. Gómez-Aleixandre

J.M. Albella

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