Journal de Physique IV

In situ characterization of atomic layer deposition processes by a mass spectrometer

M. Ritala, M. Juppo, K. Kukli, A. Rahtu and M. Leskelä

J. Phys. IV France, 09 PR8 (1999) Pr8-1021-Pr8-1028

DOI: 10.1051/jp4:19998127

M. Ritala

M. Juppo

K. Kukli

A. Rahtu

M. Leskelä

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