Magnetic properties of silicon-iron laminations Si-enriched by a SiH4 based CVD process S. Audisio, H. Idrissi, F. Khomamizadeh, J. Degauque, C. Appino, E. Ferrara, F. Fiorillo, L. Rocchino, I. Suberbielle and M. Baricco J. Phys. IV France, 08 PR2 (1998) Pr2-535-Pr2-538 DOI: 10.1051/jp4:19982124