Journal de Physique IV

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Effect of CVD process parameters on phase and chemical composition of BSCCO thin films

V.N. FUFLYIGIN, A.R. KAUL and S.A. POZIGUN

J. Phys. IV France, 03 C3 (1993) C3-361-C3-366

DOI: 10.1051/jp4:1993349

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