Journal de Physique IV

Modelling of CVD reactors : thermochemical and mass transport approaches for Si_1-xGe_x deposition

H. ROUCH, M. PONS, A. BENEZECH, J.N. BARBIER, C. BERNARD and R. MADAR

J. Phys. IV France, 03 C3 (1993) C3-17-C3-23

DOI: 10.1051/jp4:1993302

H. ROUCH

M. PONS

A. BENEZECH

J.N. BARBIER

C. BERNARD

R. MADAR

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