Journal de Physique IV

THE REACTIVITY AND MOLECULAR SIZE OF FILM PRECURSORS DURING CHEMICAL VAPOR DEPOSITION OF WSi_x

Y. SHIMOGAKI, T. SAITO, F. TADOKORO and H. KOMIYAMA

J. Phys. IV France, 02 C2 (1991) C2-95-C2-102

DOI: 10.1051/jp4:1991211

Y. SHIMOGAKI

T. SAITO

F. TADOKORO

H. KOMIYAMA

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