Journal de Physique IV

CHEMICAL VAPOR DEPOSITION OF COPPER FOR MICROELECTRONIC DEVICES BASED ON SILICON

H. DALLAPORTA, Z. HAMMADI, R. PIERRISNARD and A. CROS

J. Phys. IV France, 02 C2 (1991) C2-889-C2-895

DOI: 10.1051/jp4:19912106

H. DALLAPORTA

Z. HAMMADI

R. PIERRISNARD

A. CROS

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