Journal de Physique IV

Si-O-Si Angle Distribution in Amorphous Silica Characterized by EXAFS Multiple Scattering Calculations

A. Moen, L. Le Noc, D.T. On, L. Bonneviot, L. Lévesque and D. Roy

J. Phys. IV France, 7 C2 (1997) C2-275-C2-276

DOI: 10.1051/jp4/1997198

A. Moen

L. Le Noc

D.T. On

L. Bonneviot

L. Lévesque

D. Roy

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