Modelling of silica film growth by chemical vapour deposition : Influence of the interface properties L. Vázquez, F. Ojeda, R. Cuerno, R. Salvarezza and J. M. AlbellaJ. Phys. IV France, 11 PR3 (2001) Pr3-129-Pr3-140DOI: https://doi.org/10.1051/jp4:2001316