Deep etch lithography at LURE-D.C.I. storage ring
S. Megtert, A. Labèque, Liu Zewen, H. Dexpert, R. Comès, F. Rousseaux, M. F. Ravet, H. Launois, S. Ballandras, W. Daniau, S. Basrour, M. Rouillay, P. Blind and D. Hauden
J. Phys. IV France, 04 C9 (1994) C9-269-C9-272
DOI: https://doi.org/10.1051/jp4:1994947
