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Cited article:

Selective area deposition of titanium dioxide thin films by light induced chemical vapour deposition

E. Halary-Wagner, P. Lambelet, G. Benvenuti, P. Hoffmann

J. Phys. IV France, 11 PR3 (2001) Pr3-825-Pr3-832

DOI: https://doi.org/10.1051/jp4:20013104

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This article has been cited by the following article(s):

High uniformity deposition with chemical beams in high vacuum

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Thin Solid Films 427 (1-2) 411 (2003)
DOI: 10.1016/S0040-6090(02)01190-2
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Light-Induced CVD of Titanium Dioxide Thin Films II: Thin Film Crystallinity

E. Halary-Wagner, F. R. Wagner, A. Brioude, J. Mugnier and P. Hoffmann
Chemical Vapor Deposition 11 (1) 29 (2005)
DOI: 10.1002/cvde.200306304
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Light-induced chemical vapour deposition painting with titanium dioxide

E. Halary-Wagner, T. Bret and P. Hoffmann
Applied Surface Science 208-209 663 (2003)
DOI: 10.1016/S0169-4332(02)01421-6
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Light-Induced CVD of Titanium Dioxide Thin Films I: Kinetics of Deposition

E. Halary-Wagner, T. Bret and P. Hoffmann
Chemical Vapor Deposition 11 (1) 21 (2005)
DOI: 10.1002/cvde.200306303
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Titanium Dioxide Thin-Film Deposition on Polymer Substrate by Light Induced Chemical Vapor Deposition

E. Halary-Wagner, F. Wagner and P. Hoffmann
Journal of The Electrochemical Society 151 (9) C571 (2004)
DOI: 10.1149/1.1775931
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