On the Use of H2 Plasma for the Cleaning and Passivation of InP Substrates
J. Phys. IV France, 05 C5 (1995) C5-663-C5-670
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Synthesis of Oxide-Free InP Quantum Dots: Surface Control and H2-Assisted Growth
Edwin A. Baquero, Héloïse Virieux, Robert A. Swain, et al.Chemistry of Materials 29 (22) 9623 (2017)
https://doi.org/10.1021/acs.chemmater.7b04069