Articles citing this article

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Cited article:

Remote Microwave Plasma Enhanced Chemical Vapour Deposition of Amorphous Carbon : Optical Emission Spectroscopy Characterisation of the Afterglow and Growth Rates

C. Tixier, P. Tristant, J. Desmaison, D. Merle

J. Phys. IV France, 05 C5 (1995) C5-593-C5-600

DOI: https://doi.org/10.1051/jphyscol:1995570

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This article has been cited by the following article(s):

Remote microwave plasma-enhanced chemical vapor deposition of amorphous carbon on silicon and titanium alloy substrates

C. Tixier, P. Tristant, J. Desmaison and R. Ranc
Surface and Coatings Technology 80 (1-2) 129 (1996)
https://doi.org/10.1016/0257-8972(95)02699-1