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Cited article:

A New Route to the Deposition of Al₂O₃ by MOCVD

A.C. Jones, D.J. Houlton, S.A. Rushworth, G.W. Critchlow

J. Phys. IV France, 05 C5 (1995) C5-557-C5-560

DOI: https://doi.org/10.1051/jphyscol:1995566

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