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Coordination and organometallic precursors of group 10 and 11: Focused electron beam induced deposition of metals and insight gained from chemical vapour deposition, atomic layer deposition, and fundamental surface and gas phase studies
Low-Temperature Thermodynamic Properties of Palladium Bis-dipivaloylmethanate
M. A. Bespyatov, I. S. Cherniaikin, T. M. Kuzin and N. V. Gel’fond Russian Journal of Physical Chemistry A 96(9) 1865 (2022) https://doi.org/10.1134/S0036024422090047
Scale up of a DLI-MOCVD process for the internal treatment of a batch of 16 nuclear fuel cladding segments with a CrCx protective coating
Chemical vapour deposition of platinum films on electrodes for pacemakers: Novel precursors and their thermal properties
Svetlana I. Dorovskikh, Galina I. Zharkova, Asiya E. Turgambaeva, Vladislav V. Krisyuk and Natalia B. Morozova Applied Organometallic Chemistry 31(7) (2017) https://doi.org/10.1002/aoc.3654
Thermal Atomic Layer Deposition of Continuous and Highly Conducting Gold Thin Films
Vapor pressure and crystal lattice energy of volatile palladium(II) β-iminoketonates
G. I. Zharkova, S. V. Sysoev, P. A. Stabnikov, V. A. Logvinenko and I. K. Igumenov Journal of Thermal Analysis and Calorimetry 103(1) 381 (2011) https://doi.org/10.1007/s10973-010-0949-8
Crystal structure of volatile pyridine adducts of trimethylplatinum(IV) β-diketonates
Iridium Metal Thin Films and Patterned IrO2 Nanowires Deposited Using Iridium(I) Carbonyl Precursors
Y.‐L. Chen, C.‐C. Hsu, Y.‐H. Song, Y. Chi, A. J. Carty , S.‐M. Peng and G.‐H. Lee Chemical Vapor Deposition 12(7) 442 (2006) https://doi.org/10.1002/cvde.200606491
ALD of Rhodium Thin Films from Rh(acac)[sub 3] and Oxygen
Titta Aaltonen, Mikko Ritala and Markku Leskelä Electrochemical and Solid-State Letters 8(8) C99 (2005) https://doi.org/10.1149/1.1940507
Atomic Layer Deposition of Iridium Thin Films
Titta Aaltonen, Mikko Ritala, Väino Sammelselg and Markku Leskelä Journal of The Electrochemical Society 151(8) G489 (2004) https://doi.org/10.1149/1.1761011
Microstructure control in precious metal coatings for high temperature applications, obtained by metallorganic chemical vapour deposition
L. Gimeno‐Fabra, H. Nizard, H. Benien, J. Vlcek and A. Redjaimia Materialwissenschaft und Werkstofftechnik 34(4) 410 (2003) https://doi.org/10.1002/mawe.200390085
Chemical Vapor Deposition of Iridium, Platinum, Rhodium and Palladium