Articles citing this article

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Cited article:

Reactor Modelling and Analysis of Amorphous Hydrogenated Silicon Deposition by PECVD

A. Djelloul, B. Despax, J.P. Couderc, P. Duverneuil

J. Phys. IV France, 05 C5 (1995) C5-307-C5-314

DOI: https://doi.org/10.1051/jphyscol:1995536

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This article has been cited by the following article(s):

Laser-induced fluorescence measurements of absolute SiH densities in - RF discharges and comparison with a numerical model

Michael Hertl, Nelly Dorval, Olivier Leroy, Jacques Jolly and Michel Péalat
Plasma Sources Science and Technology 7 (2) 130 (1998)
https://doi.org/10.1088/0963-0252/7/2/006