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This article has been cited by the following article(s):
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Effect of in-situ SiNx grown with different carrier gas on structural and electrical properties of GaN-based MISHEMTs
Pattern-dependent microloading and step coverage of silicon nitride thin films deposited in a single-wafer thermal chemical vapor deposition chamber
Jacob W. Smith, Sean M. Seutter and R. Suryanaryanan Iyer Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 23(6) 2340 (2005) https://doi.org/10.1116/1.2102947