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Cited article:

Reactivities of TaCl₅ and H₂O as Precursors for Atomic Layer Deposition

H. Siimon, J. Aarik

J. Phys. IV France, 05 C5 (1995) C5-277-C5-282

DOI: https://doi.org/10.1051/jphyscol:1995532

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This article has been cited by the following article(s):

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https://doi.org/10.1063/1.4757907

In situ study of atomic layer epitaxy growth of tantalum oxide thin films from Ta(OC2H5)5 and H2O

Kaupo Kukli, Jaan Aarik, Aleks Aidla, et al.
Applied Surface Science 112 236 (1997)
https://doi.org/10.1016/S0169-4332(96)00989-0