Articles citing this article

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Cited article:

Dynamic Modeling for the Design and Cyclic Operation of an Atomic Layer Deposition (ALD) Reactor

Curtisha Travis and Raymond Adomaitis
Processes 1 (2) 128 (2013)
https://doi.org/10.3390/pr1020128

A model-based methodology for the analysis and design of atomic layer deposition processes—Part I: Mechanistic modelling of continuous flow reactors

A. Holmqvist, T. Törndahl and S. Stenström
Chemical Engineering Science 81 260 (2012)
https://doi.org/10.1016/j.ces.2012.07.015

Island growth as a growth mode in atomic layer deposition: A phenomenological model

Riikka L. Puurunen and Wilfried Vandervorst
Journal of Applied Physics 96 (12) 7686 (2004)
https://doi.org/10.1063/1.1810193

In situ study of atomic layer epitaxy growth of tantalum oxide thin films from Ta(OC2H5)5 and H2O

Kaupo Kukli, Jaan Aarik, Aleks Aidla, et al.
Applied Surface Science 112 236 (1997)
https://doi.org/10.1016/S0169-4332(96)00989-0