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This article has been cited by the following article(s):
Flash-Enhanced Atomic Layer Deposition: Basics, Opportunities, Review, and Principal Studies on the Flash-Enhanced Growth of Thin Films
Thomas Henke, Martin Knaut, Christoph Hossbach, et al. ECS Journal of Solid State Science and Technology 4(7) P277 (2015) https://doi.org/10.1149/2.0301507jss
Atomic-order thermal nitridation of Si(100) and subsequent growth of Si
T. Watanabe, M. Sakuraba, T. Matsuura and J. Murota Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 19(4) 1907 (2001) https://doi.org/10.1116/1.1359549
Surface Termination of the Ge(100) and Si(100) Surfaces by Using DHF Solution Dipping