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Cited article:

Deposition of Thick Layers, in a New CVD Reactor

H. Vergnes, E. Scheid, P. Duverneuil, J.P. Couderc

J. Phys. IV France, 05 C5 (1995) C5-997-C5-1004

DOI: https://doi.org/10.1051/jphyscol:19955117

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This article has been cited by the following article(s):

Crystallization of amorphous silicon–germanium films deposited by low pressure chemical vapor deposition

D Guillet, M Sarret, L Haji, R Rogel and O Bonnaud
Journal of Non-Crystalline Solids 266-269 689 (2000)
https://doi.org/10.1016/S0022-3093(99)00784-X