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Cited article:

The Effect of Film Thickness on the Suitability of Titanium Oxynitride (TiNxOy, x + y = 1) Films as Heat Mirrors – Formed by the Atmospheric Pressure CVD of TiCl4 and NH3

G. Hyett, R. Binions and I. P. Parkin
Chemical Vapor Deposition 13 (12) 675 (2007)
https://doi.org/10.1002/cvde.200706638

Binary and ternary NiTi-based shape memory films deposited by simultaneous sputter deposition from elemental targets

S. Sanjabi, Y. Z. Cao, S. K. Sadrnezhaad and Z. H. Barber
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 23 (5) 1425 (2005)
https://doi.org/10.1116/1.2011404

The composition and structure of TiNi thin film formed by electron beam evaporation

Hae Yong Noh, Kyu Hwan Lee, Xiang Xu Cui and Chong-Sool Choi
Scripta Materialia 43 (9) 847 (2000)
https://doi.org/10.1016/S1359-6462(00)00501-7

Effects of intermediate zinc pulses on properties of TiN and NbN films deposited by atomic layer epitaxy

Mikko Ritala, Timo Asikainen, Markku Leskelä, et al.
Applied Surface Science 120 (3-4) 199 (1997)
https://doi.org/10.1016/S0169-4332(97)00387-5