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Cited article:

Monitoring of SiC Deposition in an Industrial CVI/CVD Reactor by In-Situ FTIR Spectroscopy

H. Mosebach, V. Hopfe, M. Erhard, M. Meyer

J. Phys. IV France, 05 C5 (1995) C5-97-C5-104

DOI: https://doi.org/10.1051/jphyscol:1995509

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