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Cited article:

Study of the low frequency noise from 77 K to 300 K in NbN semiconductor thin films deposited on silicon

G. Leroy, J. Gest, P. Tabourier, J.-C. Carru, P. Xavier, E. André1, J. Chaussy

J. Phys. IV France, 12 3 (2002) 175-178

DOI: https://doi.org/10.1051/jp420020062

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This article has been cited by the following article(s):

NOISE MEASUREMENTS ON NbN THIN FILMS WITH A NEGATIVE TEMPERATURE RESISTANCE COEFFICIENT DEPOSITED ON SAPPHIRE AND ON SiO2

G. LEROY, J. GEST, L. K. J. VANDAMME and O. BOURGEOIS
Fluctuation and Noise Letters 07 (01) L19 (2007)
https://doi.org/10.1142/S0219477507003660