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Cited article:

Effects of interface roughness on the local valence electronic structure at the SiO₂/Si interface: Soft X-ray absorption and emission study

Y. Yamashita, S. Yamamoto, K. Mukai, J. Yoshinobu, Y. Harada, T. Tokushima, Y. Takata, S. Shin

J. Phys. IV France, 132 (2006) 259-262

Published online: 2006-03-11

DOI: https://doi.org/10.1051/jp4:2006132049

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This article has been cited by the following article(s):

Direct Observation of Valence and Conduction States near the SiO2/Si(100) Interface

Yoshiyuki Yamashita, Susumu Yamamoto, Kozo Mukai, et al.
e-Journal of Surface Science and Nanotechnology 6 209 (2008)
https://doi.org/10.1380/ejssnt.2008.209

Soft X-Ray Absorption and Emission Study of Silicon Oxynitride/Si(100) Interface

Yoshiyuki Yamashita, Kazuhiro Oguchi, Kozo Mukai, Jun Yoshinobu, Yoshihisa Harada, Takashi Tokushima, Shik Shin, Naoyoshi Tamura, Hiroshi Nohira and Takeo Hattori
Japanese Journal of Applied Physics 46 (1L) L77 (2007)
https://doi.org/10.1143/JJAP.46.L77