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Cited article:

Characterization of amorphous SIC:H thin films grown by RF plasma enhanced CVD on annealing temperature

M.G. Park, W.S. Choi, J.-H. Boo, Y.T. Kim, D.H. Yoon, B. Hong

J. Phys. IV France, 12 4 (2002) 155-160

DOI: https://doi.org/10.1051/jp4:20020090

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This article has been cited by the following article(s):

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Two dimensional simulation and modeling of the electrical characteristics of the a-SiC/c-Si(p) based,thyristor-like, switches

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