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Cited article:

Conductive Cu-TiO2 thin films obtained via MOCVD

F. Alvarez y Quintavalle, G.A. Battiston, U. Casellato, D. Fregona, R. Gerbasi, F. Loro

J. Phys. IV France, 12 4 (2002) 147-153

DOI: https://doi.org/10.1051/jp4:20020089

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This article has been cited by the following article(s):

Chemical solution deposition of copper thin films and integration into a multilayer capacitor structure

Song Won Ko, Tanawadee Dechakupt, Clive A. Randall, et al.
Journal of Electroceramics 24 (3) 161 (2010)
https://doi.org/10.1007/s10832-008-9551-x