Articles citing this article

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Cited article:

Preliminary design of a novel high throughput CVD reactor for photovoltaic applications

Maurizio Masi, Carlo Cavallotti, Diego Boccalari and Francesco Castellana
Crystal Research and Technology 49 (8) 614 (2014)
https://doi.org/10.1002/crat.201300391

Modeling of flame assisted chemical vapor deposition of silicon films

M. Masi, C. Cavallotti and E. Raffa
Crystal Research and Technology 46 (8) 865 (2011)
https://doi.org/10.1002/crat.201000630

Designing a large scale CVD reactor for GaAs growth on Ge substrates by multi‐hierachy modeling

D. Moscatelli, A. Veneroni, C. Cavallotti, et al.
Crystal Research and Technology 40 (10-11) 987 (2005)
https://doi.org/10.1002/crat.200410473

Fluid-dynamics during vapor epitaxy and modeling

Maurizio Masi, Marco Di Stanislao and Alessandro Veneroni
Progress in Crystal Growth and Characterization of Materials 47 (2-3) 239 (2003)
https://doi.org/10.1016/j.pcrysgrow.2005.02.002